Stain
1) Stain is the defect that can’t be clean using Wet bench cleaning alone
2) We need to use scrubbing method to clean the stain on the wafers
3) However, there is few types of the stain and the scrubbing must be done base
on the types of the stain
White spot
Whitish Dual Tone
Scrubbing
Location :
a) P1 scrubbing station – Manual and rework light stain
b) Lapping Station – Lapping and rework hard stain
Material :
Rework hard stain - Boron carbide scrubbing
Rework light stain - Detergent scrubbing
Time proposed : Min 10sec per wafers
Man : Production will allocates 2 person for scrubbing
Inspection : QC
Rework Flow
Light Stain (Post P2) Hard Stain (Post Anneal)
Detergent Scrubbing Boron carbide Scrubbing
WD1 WD0
Inspect Inspect
P2 Rework Annealing
Tropel
Scrubbing Time – 10sec
P2 rework
Process Flow
Lapping Polishing Demount
Scrubbing + WD0 QC WD1 + WD3
QC WD0 QC
EG Annealing
WD0 QC