Understanding Chemical Vapor Deposition
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ScribdTranslationsUnderstanding Chemical Vapor Deposition
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ScribdTranslationsChemical vapor deposition (CVD)
Definition
deposition of a solid on a surface from chemical reactions in
thegaseous phase.
The technique is generally performed in a furnace (chamber) in
which reactive species are introduced.
Depending on the deposition pressure values, the quality of the
couches (structural and electrical properties)
Definition: The components used by the technique
A setting
Substrate
piece
Source
Definition: The components used by the technique.
ü
A source
Place where the material to be deposited, or one of its components, is concentrated (crucible, plate)
metallic, gas bottle). It is the seat of the dispersion of the element to be deposited, in the form
of atoms, of ions, and more generally of vapor.
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A substrate
This is the piece to be coated. It is here that the physico-chemical phenomena occur:
material derived from the source, pure or recombined, comes to settle to lead to the formation
of the layer
ü
A middle
Everything that is between the source and the substrate. It is the seat of the transfer phenomenon.
of materials. This can also be the site of chemical reactions occurring between the atoms
the material to be deposited and a gas.
Techniques for the development of thin film biomaterials in vacuum
Chemical Vapor Deposition (CVD)
Technology used: CVD Reactor
The deposit room: the current events
The Basic Theory: Reminder on Perfect Gases
The basic theory: Kinetic theory of gases
The Basic Theory: Kinetic Theory of Gases
n : molar volume
a: diameter of the molecule (supposed to be a hard sphere)
The Basic Theory: Kinetic Theory of Gases
The deposit mechanisms
The deposition process can be broken down as follows:
1. Convection of the gaseous reactant (dynamic flow)
Physical transport of matter containing thermal energy.
2. Diffusion of the reagent to the substrate
3. Adsorption of the reagent on the substrate
Film
4. Migration of adsorbed species and chemical reaction on the surface
Desorption of reaction products
6. Diffusion of these products through the boundary layer
7. Evacuation
The mechanisms of deposition
1. Convection of the gaseous reactant (dynamic flux)
2. Diffusion of the reagent to the substrate
3. Adsorption of the reagent on the substrate
4. Migration of adsorbed species and chemical reaction on the surface => Film
5. Desorption of reaction products
6. Diffusion of these products through the boundary layer
7. Evacuation
The theory of deposit: Diffusion
Diffusion is the macroscopic result of thermal movements at the scale.
microscopic.
A net flow is created even though the movement of each particle is random.
The theory of deposition: Fick's Law
The flow (J) is proportional to the concentration gradient (n)
First Law of Fick:
The diffusion coefficient D can be approximated by the relation:
where m denotes the mass of the diffusing species, a the diameter of the molecule
(hard sphere model), P pressure, T temperature and k Boltzmann constant.
The theory of deposition: Second Law of Fick
The relationship between spatial and temporal variations in concentration is governed
by Fick's second law (without proof)
Who admits as a solution (case of a concentration fixed at a limit)
(x being the thickness of the deposit) Complementary error function
a video
In thermal CVD, the substrate is heated:
To provide the activation energy necessary to trigger the reaction
chemical (which can be a simple decomposition reaction)
To allow sufficient mobility of the atoms to form the structure
desired.
These temperatures range from 800 to 1000°C.
These temperatures can exceed tolerances of
SUBSTRATE……………..problem !!!!