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Liquid Additive Manufacturing Overview

The document provides an overview of Liquid Additive Manufacturing (AM), specifically focusing on photo-polymerization processes like StereoLithography Apparatus (SLA). It discusses the classification of liquid AM based on raw materials, the working principles of photo-polymerization, and the advantages and limitations of SLA technology. Key components such as the scanning system, recoating process, and laser beam characteristics are also detailed, highlighting the complexity and precision involved in the manufacturing process.

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0% found this document useful (0 votes)
14 views64 pages

Liquid Additive Manufacturing Overview

The document provides an overview of Liquid Additive Manufacturing (AM), specifically focusing on photo-polymerization processes like StereoLithography Apparatus (SLA). It discusses the classification of liquid AM based on raw materials, the working principles of photo-polymerization, and the advantages and limitations of SLA technology. Key components such as the scanning system, recoating process, and laser beam characteristics are also detailed, highlighting the complexity and precision involved in the manufacturing process.

Uploaded by

abhimishra7952
Copyright
© All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd

Unit-1 Liquid Additive Manufacturing

Introduction to Liquid AM 2

Classification: ASTM

Vat Photo Material


Material Jetting Binder Jetting Sheet Lamination
Polymerization Extrusion

 
Liquid based AM

As the name suggests, a liquid-AM process uses a liquid form of


Powder Bed Direct Energy
raw material. There are different manufacturing routes in this Fusion Deposition
broader group of AM. Therefore in course, liquid-AM processes
are further classified into the two categories viz., (i)
Polymerization, and (ii) Freezing.
Introduction to Liquid AM 3

Classification: Based on Raw Material

Type of Raw-stock

Liquid Solid Gas


Not Yet

Rapid
Photopolymer
Freezing
1
SLA
2 RF

Sheet Powder Wire


FDM,
LOM 3DP, SLS, DED
WAAM
Photo-polymerization based Liquid AM 4

Working Principle Demo


Photoinitiator, 𝑃𝑖 Photoinitiator excitation and Chain propagation
Chain initiation
Monomer, M Free radical (𝑃𝑖 )̇ generation

ℎ𝜈

• The photo-polymerization based liquid-AM processes build objects by photo-


curable liquid resin that cures or hardens under the exposure to a UV light. Chain Termination

• The UV light scans the cross-section of each slice to selectively curing it. After
complete curing of a layer, the build platform is pull down/up, and the next layer of
liquid resin spreads over/below the previous layer and similarly got cured.
• The whole object built by repeating the process for each layer.
• The uncured liquid drained from the vat and the object proceeds for further
processing.
Photo-polymerization based Liquid AM 5

Working Principle: Sub-systems

1
Photo-polymer Liquid

2
UV Light

3
Scanning System

4
Build Direction

5
Recoating System
Photo-polymerization based Liquid AM 6

Working Principle: Sub-systems


Galvanometer Flying Liquid Flying Optics DLP Mask
Scanning System
Photo-polymerization based Liquid AM 7

Working Principle: Sub-systems


Galvanometer Flying Liquid Flying Optics DLP Mask
Scanning System

Laser Beam Flood Light


Shape of UV Light

Liquid – Vat Liquid – Jet


Shape of Liquid

+Z Direction - Z Direction Variable direction


Build Direction

Deep Dipping Top Bottom Feeding


Recoating System
Feeding
Photo-polymerization based Liquid AM 8

Working Principle: Sub-systems


Galvanometer Flying Liquid Flying Optics DLP Mask
Scanning System

3D System’s SLA
Laser Beam Flood Light 3D System’s SLA (Zephyr)
Shape of UV Light
Microstereolithography
Objet Polyjet
Autostrade’s E-Dart
Liquid – Vat Liquid – Jet
Shape of Liquid Perfectory Acculas
Solid Ground Curing (SGC)
Robotic – SLA
+Z Direction - Z Direction Variable direction
Build Direction

Deep Dipping Top Bottom Feeding


Recoating System
Feeding
Photo-polymerization based Liquid AM 9

StereoLithography Apparatus (SLA)


Galvanometer Flying Liquid Flying Optics DLP Mask
Scanning System

3D System’s SLA
Laser Beam Flood Light 3D System’s SLA (Zephyr)
Shape of UV Light
Microstereolithography
Objet Polyjet
Autostrade’s E-Dart
Liquid – Vat Liquid – Jet
Shape of Liquid Perfectory Acculas
Solid Ground Curing (SGC)
Robotic – SLA
+Z Direction - Z Direction Variable direction
Build Direction

Deep Dipping Top Bottom Feeding


Recoating System
Feeding
Photo-polymerization based Liquid AM 10

StereoLithography Apparatus (SLA)


Galvanometer
Scanning System
3D System’s SLA
3D System’s SLA (Zephyr)
Laser Beam
Shape of UV Light

Liquid – Vat
Shape of Liquid

+Z Direction
Build Direction

Deep Dipping Top Feeding


Recoating System
Photo-polymerization based Liquid AM 11

StereoLithography Apparatus (SLA)


3D System’s SLA
Photo-polymerization based Liquid AM 12

StereoLithography Apparatus (SLA)


• Support structures are generated wherever required.
Pre-Processing • Planar slicing is performed.

• The table goes down by the required layer thickness and new liquid layer is
recoated (Deep Dipping/ Top Feeding)
Build -Process

• The beam scans the liquid layer. For each loop, the border is made and then area
filling is done. The outer contour is scanned with a small diameter laser beam
and area filling is done using a larger diameter beam.
• After all layers are made, the table rises completely revealing the part.
• After the liquid has drained, it is removed from the table and the support
structure is carefully cut off.
• The part is kept in a post-cure apparatus where it is kept under UV
Pre-Processing radiation to complete polymerization.
• The part is finished and painted as required.
Photo-polymerization based Liquid AM 13

StereoLithography Apparatus (SLA)

Advantages
• Fastest and the most accurate of all processes due to tiny moving parts and fine-tuned
system through extensive research.
• Transparent parts with fine surface finish are ideal for photo-elasticity.
• QuickCast is suitable for producing castings of any metal.

Limitations
• Expensive.
• Parts become brittle over a period due to continued polymerization through ambient
light.
• Parts are limited to photopolymers.
• Not suitable for office environment. The fumes are health hazards.
Photo-polymerization based Liquid AM 14

StereoLithography Apparatus (SLA)


1. 1 3
1 A UV Laser beam is used as an energy source
which scan the selected region over a layer of 2
liquid photo-polymer to cure it.
2.
2 The power density of the laser spot and material
properties are two major factors to govern the 4
curing process.
3.
3 The Laser beam is positioned using two small 4
mirrors (Galvenometer) capable of deflecting the
5
beam in two directions. Being a very low inertia of
the mirrors the scanning speed is very high.
4 A recoating system (Deep Dipping) is used to
4.
spread the new liquid layer on pre-build geometry
5 Z-Axis of the machine
5.
Photo-polymerization based Liquid AM 15

StereoLithography Apparatus (SLA): Laser Beam


Light Amplification by Stimulated Emission of Radiation
• Light: light is any Electromagnetic Radiation (ER) which acts as a wave and particle. A
particle with light energy is called as photon.
• All types of ER travel at the same speed in vacuum but vary in frequency and
wavelength. Hence different interaction with different material.
Photo-polymerization based Liquid AM 16

StereoLithography Apparatus (SLA): Laser Beam


Monochromatic light
Photo-polymerization based Liquid AM 17

StereoLithography Apparatus (SLA): Laser Beam

Coherence
Photo-polymerization based Liquid AM 18

StereoLithography Apparatus (SLA): Laser Principle


Photo-polymerization based Liquid AM 19

StereoLithography Apparatus (SLA): Laser Principle

• Two spatial modes describe the beam are:


o Longitudinal
o Transverse
• Essentially independent of each other
o Transverse dimension in a resonator is
normally considerably smaller than the
longitudinal

Transverse Electro-Magnetic y
Modes describe the shape of
energy distribution in the
x
beam cross section.
Photo-polymerization based Liquid AM 20

StereoLithography Apparatus (SLA): Laser Principle


Mathematical the Gaussian power intensity (power/area) distribution of a laser beam can
be given as:
2𝑟 2
𝐼𝑟 = 𝐼0 exp − 2
𝑤
Where 𝐼𝑟 is the power intensity (𝑊/𝑚2 ) at radius r, along the beam cross-section, 𝐼0 is the
power intensity for 𝑟 = 0, and 𝑤 is the magnitude of 𝑟 at which the power intensity is a
fraction 1/𝑒 2 of 𝐼0 .

z
y

x
Photo-polymerization based Liquid AM 21

StereoLithography Apparatus (SLA)


Galvanometer
Scanning System
3D System’s SLA
3D System’s SLA (Zephyr)
Laser Beam
Shape of UV Light

Liquid – Vat
Shape of Liquid

+Z Direction
Build Direction

Deep Dipping Top


Recoating System
Feeding
Photo-polymerization based Liquid AM 22

StereoLithography Apparatus (SLA)


1. 1 3
1 A UV Laser beam is used as an energy source
which scan the selected region over a layer of 2
liquid photo-polymer to cure it.
2.
2 The power density of the laser spot and material
properties are two major factors to govern the 4
curing process.
3.
3 The Laser beam is positioned using two small 4
mirrors (Galvanometer) capable of deflecting the
5
beam in two directions. Being a very low inertia of
the mirrors the scanning speed is very high.
4 A recoating system (Deep Dipping) is used to
4.
spread the new liquid layer on pre-build geometry
5 Z-Axis of the machine
5.
Photo-polymerization based Liquid AM 23

StereoLithography Apparatus (SLA): Galvanometer

[Link]
Photo-polymerization based Liquid AM 24

StereoLithography Apparatus (SLA): Galvanometer


Photo-polymerization based Liquid AM 25

StereoLithography Apparatus (SLA): Galvanometer


Photo-polymerization based Liquid AM 26

StereoLithography Apparatus (SLA): Galvanometer

∠𝑜1 𝑜2 𝑎 = 90°

∠𝑏𝑎𝑜2 = 90° ∠𝑐𝑐 ′ 𝑜3 = 90° ∠𝑑𝑑 ′ 𝑜3 = 90°

Law of reflection: when a ray of light, is reflected from a


smooth surface the angle of reflection is equal to the angle of
incidence, and the incident ray, the reflected ray, and the normal
to the surface at the point of incidence all lie in the same plane.
Based on this principle one can deduce the following:

∠𝑜2 𝑜1 𝑜3 = ∠𝑐𝑜3 𝑐 ′ = ∠𝑑𝑜3 𝑑 ′ = 𝜃𝑥

∠𝑜2 𝑏𝑎 = ∠𝑐 ′ 𝑑 ′ 𝑜3 = ∠𝑐𝑑𝑜3 = 𝜃𝑦
Photo-polymerization based Liquid AM 27

StereoLithography Apparatus (SLA): Galvanometer


If
𝑎𝑜2 = 𝑜3 𝑐 ′ = ℎ, o1 𝑜2 = 𝑒
In the right angle triangle Δ𝑜2 𝑎𝑏
𝑦 = 𝑎𝑏 = ℎ tan 𝜃𝑦
In the right angle triangle Δ𝑜3 𝑑 ′ 𝑑 (try to visualize the plane of
triangle)
𝑥 = 𝑏𝑑 ′ + 𝑑 ′ 𝑑

𝑏𝑑 ′ = 𝑜2 𝑜3 = 𝑒 tan 𝜃𝑥
𝑑𝑑 ′ = 𝑜3 𝑑′ tan 𝜃𝑥 = 𝑜2 𝑏 tan 𝜃𝑥 = ℎ2 + 𝑦 2 tan 𝜃𝑥

𝑥 = 𝑒 tan 𝜃𝑥 + ℎ2 + 𝑦 2 tan 𝜃𝑥

𝑒 + ℎ2 + 𝑦 2 tan 𝜃𝑥 , ℎ tan 𝜃𝑦
Photo-polymerization based Liquid AM 28

StereoLithography Apparatus (SLA): Galvanometer: Advantages & Disadvantage

Advantages

• Low inertia of the tiny mirror moves the laser beam with a very faster speed (up
10 m/sec) on the surface of the vat-photopolymer.
• Long life of the galvanometer

Disadvantages

• Lost of energy on the mirrors


• Defocus laser beam on the platform
• Laser beam spot distortion Beam Correction
Photo-polymerization based Liquid AM 29

StereoLithography Apparatus (SLA): Galvanometer: Beam Correction

Beam deflected from a spherical lens

Locus of the focal point for


deflected beam at different angles
Photo-polymerization based Liquid AM 30

StereoLithography Apparatus (SLA)


1. 1 3
1 A recoating system (Deep Dipping) is used to
spread the new liquid layer on pre-build geometry 2
2. Z-Axis of the machine
2
4 4

4
5
Photo-polymerization based Liquid AM 31

StereoLithography Apparatus (SLA): Recoating

Recoating
Photo-polymerization based Liquid AM 32

StereoLithography Apparatus (SLA): Recoating


• Recoating is the process of establishing a new layer of fresh resin over the previously cured layer.

• A successful recoating step is one that is capable of establishing a fresh layer of liquid resin of thickness
exactly equal to the desired thickness, 𝑡𝑙 , within a reasonably short time.

• An incorrect layer thickness will adversely affect the accuracy of the product.

• Owing to effects related to the viscosity and surface tension properties of the liquid resin, it is not easy to
meet these requirements. As a result, one needs to adopt quite a complex recoating cycle involving
following stages:
1. Leveling
2. Deep dipping
3. Elevating
4. Sweeping
5. Obtaining Build Position
6. Z-wait
Photo-polymerization based Liquid AM 33

StereoLithography Apparatus (SLA): Recoating: Leveling

• If resin did not shrink upon polymerization, this step would only be
necessary at the start, to insure that the resin was at the proper z-
level.

• However, typical resin undergo about 5% to 7% total volumetric


shrinkage.

• A level compensation system (contact/non-contact) is implemented


in SLA.

• The level compensation system maintained a tolerance in the z-level.

• If the resin lies within this tolerance limits, the levelling operation is
completed.
Photo-polymerization based Liquid AM 34

StereoLithography Apparatus (SLA): Recoating: Deep dipping

• The elevator fully immerses the previously completed part


under computer control to allow the resin to flow over the part

• Owing to the high viscosity of the resin, the resin will take
quite some time before it assumes a level surface over the
entire part.
• Hence, there will be a depression in the resin surface above the
part.

• The depression can be quite significant over regions with


trapped resin volumes. Such volumes occur when there are
pockets of liquid resin within the part interior that do not have
connecting passages to the rest of the liquid in the vat.
Photo-polymerization based Liquid AM 35

StereoLithography Apparatus (SLA): Recoating: Deep Dipping


The time, 𝑇𝑑 , taken for the depression to be thus 'closed' has been
studied by means of viscous flow analyses and experimental studies
𝑅𝑐 × 𝜇
𝑇𝑑 ∝
h2𝑑

where 𝑅𝑐 is the so-called 'critical circle radius' for that cross-section,


𝜇 is the viscosity of the resin and ℎ𝑑 is the depth of the depression.

A critical circle is the maximum distance on any cross-section’s


geometry that resin must travel to flow off the part.

As the value of 𝜇 and 𝑅𝑐 are fixed the only possibility of reducing time taken for filling the depression is by
increasing the dipping height (ℎ𝑑 ). Hence called as deep dipping.
Photo-polymerization based Liquid AM 36

StereoLithography Apparatus (SLA): Recoating: Elevating

• The third stage starts once the depression has closed reasonably.
The platform is elevated until the top layer of the part is above the
resin surface.

• As a result, there will be a layer of thickness exceeding 𝑡𝑙 resting


on part's upper surface

• This step is required so that during next step of sweeping only the
material above the part should be disturbed not rest of the resin.
Photo-polymerization based Liquid AM 37

StereoLithography Apparatus (SLA): Recoating: Elevating

• At this point the recoating blade traverse one end of the vat to
another end and sweeps the access material.

• For majority of part geometry the optimum sweep period is


about 5 second.

• However, it appears that recoating behavior is quite sensitive to


the presence of trapped volumes of resin in the part. For
instance, for parts without trapped volumes, changing the blade
velocity in the range 5 to 120mrn/s does not significantly affect
the final layer thickness. However, this is not the case when
there are trapped resin volumes.
Photo-polymerization based Liquid AM 38

StereoLithography Apparatus (SLA): Recoating: Sweeping


• If we ignore the viscous behavior of the resin, we would expect the resulting layer thickness, L, to be equal
to the preset gap, g.

• Owing to finite surface tension effects, some resin has adhered to the trailing edge of the blade
• Due to viscous drag there will be a bulge close to the leading edge. (leading edge bulge)
• A consequence of this is that the actual layer thickness, 𝑡𝑙 , following the sweeping process will be smaller
than the gap, 𝐿𝑔 .
Photo-polymerization based Liquid AM 39

StereoLithography Apparatus (SLA): Recoating: Obtaining Build Position

• Next, the elevator is lowered again such that the part is in the
right position for scanning the next layer.

• The resin surface at the beginning of this stage is still


disturbed.

• In particular, owing to finite surface tension effects, there is


usually a visible crease at the solid to liquid interface around
the perimeter of the part.

• Experiments have shown that this crease fades away


exponentially over time.
Photo-polymerization based Liquid AM 40

StereoLithography Apparatus (SLA): Recoating: Z-Wait

• A waiting period (called 'Z-Wait') is introduced for the resin


surface to blend and reach the configuration shown in figure.

• The Z-wait period is usually determined through a compromise


between surface non-uniformity and build time.

• One needs to choose a longer Z-wait when a large 𝑡𝑙 is chosen.


These observations might give the impression of unduly long Z-
Wait.

• However, fortunately, with current technology, it is possible to


complete computation and adjustment of resin level per layer
within one second. The problem is still noteworthy because
practical parts contain thousands of layers.
Photo-polymerization based Liquid AM 41

Perfactory
Galvanometer Flying Liquid Flying Optics DLP Mask
Scanning System

3D System’s SLA
Laser Beam Flood Light 3D System’s SLA (Zephyr)
Shape of UV Light
Microstereolithography
Objet Polyjet
Autostrade’s E-Dart
Liquid – Vat Liquid – Jet
Shape of Liquid Perfectory Acculas
Solid Ground Curing (SGC)
Robotic – SLA
+Z Direction - Z Direction Variable direction
Build Direction

Deep Dipping Top Bottom Feeding


Recoating System
Feeding
Photo-polymerization based Liquid AM 42

Perfactory
Galvanometer Flying Liquid Flying Optics DLP Mask
Scanning System

Laser Beam Flood Light


Shape of UV Light

Liquid – Vat Liquid – Jet


Shape of Liquid Perfectory Acculas

+Z Direction - Z Direction Variable direction


Build Direction

Deep Dipping Top Bottom Feeding


Recoating System
Feeding
Photo-polymerization based Liquid AM 43

Perfactory
• It is the Photo polymerization based AM system with the best Cost/Performance
ratio providing, better accuracy and resolution than SLA with far lower capital and
running costs.
• Driven by DLP-Technology
• Invented By Mr. Hendrik John of Envisiontec, Germany.

Digital Mask
3D CAD Model Sliced Data Projection 3D Solid Model
Photo-polymerization based Liquid AM 44

Perfactory: Key Features


➢The inverted build platform improves part quality and speed by:

➢Reduced cycle time

➢ Minimising the need for support structures

➢ No laser

➢ Mask projection with DLP optical semiconductor technology

➢ Mirror have a life time of 22000 hrs


Photo-polymerization based Liquid AM 45

Objet Polyjet
Galvanometer Flying Liquid Flying Optics DLP Mask
Scanning System

Laser Beam Flood Light


Shape of UV Light
Objet Polyjet

Liquid – Vat Liquid – Jet


Shape of Liquid

+Z Direction - Z Direction Variable direction


Build Direction

Deep Dipping Top Bottom Feeding


Recoating System
Feeding
Photo-polymerization based Liquid AM 46

Objet Polyjet
• ObJet is very similar to SLA in principle; viz., when a
light of appropriate wave length falls on liquid
photopolymer, the energy absorbed causes
polymerization. The polymerized photopolymer will
be in solid state.
• Principle of Inkjet printing is used, ink being
replaced by liquid photopolymer. Raster-based
printing technology.
• Multiple jets are used to improve productivity.
Presently 8 pairs of jets. As MEMS technology
improves, more heads can be packed.
• A flood of UV light is thrown on the table when
printing takes place.
• Explicit support structures are required. Water
soluble gel is used as the support which is not
photosensitive. The support is simply blown off by a
jet of water.
Photo-polymerization based Liquid AM 47

Objet Polyjet

8 heads
o Synchronous jetting with sophisticated head
o simultaneously jetting - identical amounts of resin
o Super thin layers of 16 microns
o Immediate UV–curing of each layer

o Easy to replace jetting head


o Standard procedure to determine head to replace
o Office environment - like replacing inkjet heads
Photo-polymerization based Liquid AM 48

Objet Polyjet
Advantages
• Quality models: Accurate, detailed, smooth-surfaced models with any geometry design
• Fast: Raster → X is an axis and Y is just indexing; multiple jets will reduce number of indexing in Y.
• Good material properties: good flexibility, impact strength & transparency – suitable for photo-elasticity
• Easy Operation: Reliable, easy to use, easy to remove support
• Clean process. Suitable for office environment.
• No post-curing
• Easy maintenance: any pair of nozzles can be replaced individually.
• Format/Build size for shoes, mold makers, automotive & service bureaus.

Limitations
• Same as SLA
Photo-polymerization based Liquid AM 49

Objet Polyjet
Modelling:

• Ractangular source of UV light.


• Material flow rate
• Speed of head
• Size of head (indexing)
Photo-polymerization based Liquid AM 50

Solid Ground Curing (SGC)


Galvanometer Flying Liquid Flying Optics DLP Mask
Scanning System

Laser Beam Flood Light


Shape of UV Light

Liquid – Vat Liquid – Jet


Shape of Liquid
Solid Ground Curing (SGC)

+Z Direction - Z Direction Variable direction


Build Direction

Deep Dipping Top Feeding Bottom Feeding


Recoating System
Photo-polymerization based Liquid AM 51

Solid Ground Curing (SGC)


• The Solid Ground Curing (SGC) System is produced by Cubital Ltd started in 1987 and
commercialization begin in 1991.
• SGC is very similar to SLA in principle; viz., when a light of appropriate wave length falls on liquid
photopolymer, the energy absorbed causes polymerization. The polymerized photopolymer will be
in solid state.
• A flood of UV light is used in SGC as against the pointed laser light in SLA. The associated change is
the absence of image scanning; instead, the flood is made to pass through an optical mask. This
mask is the negative of the region to be polymerized. The regions of liquid polymer where light falls
become solid. The remaining liquid can be drained and its place is filled by liquid wax.
• As the entire area is exposed together, this process is very fast. Build time is proportional to the
height of the object and not volume.
• The power of the laser and exposure time decides the layer thickness.
• Explicit support structures are required. This is achieved simply by pouring wax in the regions not
affected by the light; no need for computing the region requiring support and modify the CAD
model.
52

Creation of
photomask

Final curing Resin


HP UV Lamp recoating

Face Milling Photomask


placed

Wax UV lamp is
Recoating turned on
Removal of
uncured liquid
Photo-polymerization based Liquid AM 53

Solid Ground Curing (SGC)


Advantages
• The entire layer is addressed (i.e., exposed) in one go. Hence very fast. This high speed allows
production-like fabrication of many parts or large parts.
• No post-cure is required as the polymerization is complete in the machine itself.
• Milling step ensures flatness for subsequent layer and Z accuracy. This approach is adopted in a
few other systems for very high accuracy.
• Supports are obtained by filling wax after sucking the liquid polymer; no extra support
calculations are needed.
Limitations
• The process has two cycles and many sub-systems (masking cycle, polymer spreader, polymer
cleaner, wax spreader, wax cooling plate, milling head, vacuum suction of chips); hence, less
reliable. Furthermore, this requires a full time operator attention.
• Building time depends on only the height of the part and not its volume.
• Dewaxing is time-consuming.
• Creates a lot of waste of wax.
Photo-polymerization based Liquid AM 54

Microstereolithography
Galvanometer Flying Liquid Flying Optics DLP Mask
Scanning System

Laser Beam Flood Light


Shape of UV Light
Microstereolithography

Liquid – Vat Liquid – Jet


Shape of Liquid

+Z Direction - Z Direction Variable direction


Build Direction

Deep Dipping Top Bottom Feeding


Recoating System
Feeding
Photo-polymerization based Liquid AM 55

Microstereolithography

• Very accurate parts with an


accuracy of 10𝜇𝑚.
• Facus point of the laser remin fixed
and X-Y stage is used for moving
the resin bed
• It is very slow as compare to other
processes
• Resin has been mixed with the
ceramic powder by Basrour et. al.
2001.
Photo-polymerization based Liquid AM 56

Robotic – SLA
Galvanometer Flying Liquid Flying Optics DLP Mask
Scanning System

Laser Beam Flood Light


Shape of UV Light

Liquid – Vat Liquid – Jet


Shape of Liquid
Robotic – SLA

+Z Direction - Z Direction Variable direction


Build Direction

Deep Dipping Top Feeding Bottom Feeding


Recoating System
Photo-polymerization based Liquid AM 57

Robotic – SLA

Pan, Yayue, et al. "Multitool and multi-axis computer numerically controlled accumulation for fabricating conformal features on
curved surfaces." Journal of Manufacturing Science and Engineering 136.3 (2014).
Photo-polymerization based Liquid AM 58

Other Systems: Two Laser Beam System


• Opposed to SLA and other similar methods, this method no longer works only on the top surface of a vat
of resin, instead, the work volume exist anywhere in the vat.
• In the two-laser-beam method, two lasers are focused to intersect at a particular point in the vat and
called as two step photopolymerization
• In the method, it is assumed that one laser excites molecules all along its path in the vat. While most of
these molecules will return back to their unexcited state after a short time, those also in the path of the
second laser will be further excited to initiate the polymerization process.
• On this basis, the resin cures at the
point of intersection of the two laser
beams, while the rest lying along either
of the two paths will remain liquid.
Photo-polymerization based Liquid AM 59

Other Systems: Two Beam System


Three major problems occur in such a process.

First problem, the focusing problem exists because each laser beam undergoes numerous refraction as its
ray moves from the source in air and through the liquid resin. Non-uniformities in the refractive index of
the resin are difficult to control and monitor because of the following reasons:
(1) Different progress of curing can cause non-uniformities.
(2) Inherent non-uniformities in the resin itself.
(3) Change of temperature in the vat.

The second problem is how can two laser beams moving at high speed be focused to a very small and
accurate point of intersection. The problem is compounded by the high energies required of the two lasers,
which means that the two lasers will have short focal lengths. Thus, the distance is limited and in turn, this
limits the size of the part that can be made by this method.

Third, it is not always the case that molecules lying along the paths of either laser beams will return to the
liquid state. This means unwanted resins may be formed along the path of either laser beams.
Consequently, the cured resins may pose further problems to the rest of the process.
Photo-polymerization based Liquid AM 60

Other Systems: Volumetrical Stereolithography


Freezing based Liquid AM 61

Rapid Freezing Prototyping (RFP)


Most of the discussed polymerization based liquid AM processes are quite expensive and many of them
generate substances such as smoke, dust, hazardous chemicals, etc., which are harmful to human health
and the environment. Continuing innovation is essential in order to create new rapid prototyping
processes that are fast, clean, and of low-cost.

Dr. Ming Leu of the University of Missouri-Rolla, Virtual & Rapid Prototyping Lab. has developed an
environmentally AM process that uses cheap and clean materials and can achieve good layer binding
strength, fine build resolution, and fast build speed. They have invented such a process, called Rapid Freeze
Prototyping (RFP), that can make three-dimensional ice parts of arbitrary geometry layer-by-layer by
freezing of water droplets.

It consist of three sub-systems:


a. A 3D positioning subsystem
b. A liquid deposition subsystem
c. Freezing chamber
d. Electronic control device
Freezing based Liquid AM 62

Rapid Freezing Prototyping (RFP)


• The XYZ table is kept inside the freezing chamber under low temperature around (−20°𝐶).
• The part is mounted on the Z-table and after deposition of each layer the elevator move down.
• The fallen droplets freeze rapidly by convection through cold environment and and conduction by
previously frozen layer.

Two material extrusion method


Freezing based Liquid AM 63

Rapid Freezing Prototyping (RFP)


• To produce overhanging/undercut features a support material is deposited in the required region of
the layer.
• Build material : pure water, support material is eutectic sugar solution C6 H12 O6 − H2 O
Saline water
Pure water
(support material)

- 20oC - 4oC
Thank You

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