Chapter 14 Solutions: Semiconductor Devices
Chapter 14 Solutions: Semiconductor Devices
Chapter 14
14.1 1.24
(b) 0.653 m
1.24
max m 1.90
Eg (i) From Figure 14.4, 2.6 10 4 cm 1
1.24 I d
(a) Si: max 1.11 m (ii) exp d
1.12 I 0
(b) Ge: max
1.24
1.88 m
exp 2.6 10 4 0.80 10 4
0.66 0.125
(c) GaAs: max
1.24
0.873 m Fraction absorbed 1 0.125 0.875
1.42 _______________________________________
1.24
(d) InP: max 0.919 m 14.4
1.35
I x
_______________________________________ g
h
14.2 1.24
(a) For 480 nm, For h 1.3 eV, 0.95 m
1 .3
1.24 1.24
E 2.58 eV For silicon: 310 2 cm 1
Then for I x 10 2 W/cm 2 , we obtain
0.480
For 725 nm,
1.24 g
3 10 10
2 2
E
0.725
1.71 eV
1.6 10 1.3 19
9 10 3
0.733 W/cm 2
Semiconductor Physics and Devices: Basic Principles, 4th edition Chapter 14
By D. A. Neamen Problem Solutions
______________________________________________________________________________________
I d where L p D p p
(b) 0.1 exp d
I 0 The photon flux in the semiconductor is
0.1 exp 9 10 3 d x O exp x
1 1 and the generation rate is
d ln G L x O exp x
9 10 3
0.1
so the differential equation becomes
2.56 10 4 cm 2.56 m
d 2 p n p n O
_______________________________________ 2 exp x
dx 2 Lp Dp
14.6 The general solution is of the form
1.24 1.24 x
0.886 m p n x A exp B exp x
E 1.40 Lp Lp
From Figure 14.4, 4.5 10 2 cm 1
O p
I d 2 2 exp x
(a) 0.1 exp d L p 1
I 0
As x , p n 0 so that B 0 . Then
1 1 1 1
d ln ln x O p
0.1 4.5 10 0.1
2
p n x A exp exp x
L p 2 L2 1
5.12 10 3 cm 51.2 m p
At x 0 , we have
1 1
(b) d ln d p n
4.5 10 2
0.3 Dp sp n
dx x 0 x 0
2.68 10 3 cm 26.8 m
so we can write
_______________________________________
O p
p n A 2 2
14.7 x 0 L p 1
GaAs: and
For x 1 m 10 4 cm, we have 50% d p n A O p
2
At x W , 25 10
Dn
d n p
s o n p
3
5 10 10
16 3 15
2.236 10 10
10
dx x W x W J S 1.790 10 A/cm 2
Now
I S AJ S 5 1.79 10 10
W
n p W G L n cosh 8.950 10 10 A
Ln (a) I L eG L AW
W We find
B sinh G L n
Ln
Vbi 0.0259 ln
1016 1015
0.6350 V
and
1.5 1010
2
d n p G L n W
sinh 2 V Na Nd
1/ 2
dx x W Ln Ln W s bi
e N N
W a d
B
Ln
cosh
Ln
211.7 8.85 10 14 0.635
so we can write 1.6 10 19
G L n Dn W BDn W 10 16 1015
1/ 2
sinh
L cosh L
16
Ln Ln n n
10 10
15
W
s o G L n cosh W 9.508 10 5 cm
Ln Then
W
I L 1.6 10 19 5 10 21 5 9.508 10 5
B sinh G L n
0.380 A 380 mA
Ln
I
Solving for B, we obtain (b) Voc Vt ln 1 L
W W IS
G L L n sinh s o n cosh 1
0.380
Ln L n 0.0259 ln 1
B 10
8.95 10
Dn W W
cosh s o sinh Voc 0.5145 V
Ln n
L Ln Voc 0.5145
(c) 0.810
Vbi 0.635
_______________________________________
Semiconductor Physics and Devices: Basic Principles, 4th edition Chapter 14
By D. A. Neamen Problem Solutions
______________________________________________________________________________________
14.11 V V I
From Problem 14.10, I S 8.95 10 10 A (ii) 1 m exp m
V
1 L
Vt t IS
I 10 10 3
(a) Voc Vt ln 1 L 1
IS 8.95 10 10
120 10 3 1.117 10 7
0.0259 ln 1
10
8.95 10 By trial and error, V m 0.351 V
0.4847 V Now
V V
(b) I I L I S exp 1 I m I L I S exp m 1
Vt Vt
100 10 3 120 10 3 10 10 3
V
8.95 10 10 exp
1
0.351
8.95 10 10 exp 1
0.0259
Vt
V 0.4383 V I m 9.3110 3 A 9.31 mA
V V I Then
(c) 1 m exp m
V
1 L
Pm I mVm 9.310.351 3.27 mW
Vt t IS
(b)
120 10 3
1 100 10 3
8.95 10 10 (i) Voc 0.0259 ln 1
10
8.95 10
1.34110 8
0.480 V
By trial and error, V m 0.412 V
V V I
Now (ii) 1 m exp m 1 L
V Vt Vt IS
I m I L I S exp m 1 100 10 3
Vt 1
8.95 10 10
120 10 3
1.117 10 8
0.412
8.95 10 10 exp 1 By trial and error, Vm 0.407 V
0.0259 Now
I m 112.75 10 3 A 112.75 mA V
I m I L I S exp m 1
Pm I mVm 112.750.412 Vt
46.5 mW
100 10 3
V 0.412
(d) V m I m R L R L m
I m 0.11275
0.407
8.95 10 10 exp 1
0.0259
R L 3.65
_______________________________________ I m 9.40 10 2 A 94.0 mA
Then
14.12 Pm I mVm 94.00.407 38.3 mW
From Problem 14.10, I S 8.95 10 10 A P 38.3
(c) m 2 11.7
(a) Pm1 3.27
I _______________________________________
(i) Voc Vt ln 1 L
IS
10 10 3
0.0259 ln 1
10
8.95 10
0.420 V
Semiconductor Physics and Devices: Basic Principles, 4th edition Chapter 14
By D. A. Neamen Problem Solutions
______________________________________________________________________________________
14.13 V
J
I 50 10 3 4.579 10 12 exp 1
VOC Vt ln 1 L Vt
JS We see that when I 0 , V VOC 0.599 V.
30 10 3
0.0259 ln 1
We find
JS
where V (V) I (mA)
0 50
1 Dn 1 Dp
J S en i2 0.1 50
N a n Nd p 0.2 50
0.3 50
which becomes 0.4 49.98
J S 1.6 10 19 1.8 10 6
2
0.45 49.84
0.50 48.89
1 225 1 7
8
19 0.55 42.36
N a 5 10 10 5 10 8 0.57 33.46
or 0.59 14.19
6.708 10 4
J S 5.184 10 7 1.183 10 15 (b) The voltage at the maximum power point
N a is found from
Then Vm Vm I
N a (cm 3 ) J S (A/cm 2 ) VOC (V) 1 exp 1 L
Vt Vt IS
10 15 3.477 10 17 0.891 50 10 3
1
10 16 3.478 10 18 0.950 4.58 10 12
19
10 17
3.484 10 1.01 1.092 1010
10 18 3.539 10 20 1.07 By trial and error,
_______________________________________ V m 0.520 V
At this point, we find
14.14 I m 47.6 mA
(a) so the maximum power is
I L J L A 25 10 3 2 50 10 3 A Pm I mVm 47.60.520
We have or
1 D 1 Dp Pm 24.8 mW
J S en i2 n
(c) We have
N a n Nd p
V V 0.520
or V IR R m
I I m 47.6 10 3
J S 1.6 10 19 1.5 1010 2
or
1 18 1 6 R 10.9
6
19 7 _______________________________________
3 10 16
5 10 10 5 10
which becomes 14.15
J S 2.289 10 12 A/cm 2 180 10 3
or (a) Voc 0.0259 ln 1
2 10 9
I S 4.579 10 12 A 0.474 V
We have V V I
V (b) 1 m exp m 1 L
I I L I S exp 1 Vt Vt IS
Vt 180 10 3
or 1 9 10 7
2 10 9
Semiconductor Physics and Devices: Basic Principles, 4th edition Chapter 14
By D. A. Neamen Problem Solutions
______________________________________________________________________________________
14.20
exp x
1
10 n-type, so holes are the minority carrier
0 .1
(a)
or
p G L p 10 21 10 8
1
x ln 10 or
p n 1013 cm 3
For h 1.7 eV , 10 4 cm 1
(b)
Then
1
ep n p
x 4 ln 10 2.3 10 4 cm
10
1.6 10 19
10 8000 250
13
or or
x 2.3 m 1.32 10 2 ( -cm) 1
and for h 2.0 eV, 10 5 cm 1 . (c)
Then I L J L A A
AV
1 L
x 5 ln 10 0.23 10 4 cm
1.32 10 10 4 5
2
10
or 100 10 4
x 0.23 m or
I L 0.66 mA
_______________________________________
(d)
14.19 IL
ph
(a) no N d 51015 cm 3 eG L AL
I e n no A 0.66 10 3
1.6 10 19 1200 5 1015 1.6 10 19
10 21 10 4 100 10 4
or
5 10 4
3
4
ph 4.125
120 10
_______________________________________
I 0.12 A 120 mA
(b) p GL p 0 10 21 10 7 1014 cm 3 14.21
(c) ep n p
x O exp x
1.6 10 10 1200 400
19 14 The electron-hole generation rate is
g x O exp x
2.56 10 2 ( -cm) 1 and the excess carrier concentration is
(d) I L A p p x
2.56 10 2 5 10 4 3
4
Now
ep n p
120 10
3
3.2 10 A 3.2 mA and
IL J L
(e) ph The photocurrent is now found from
eG L AL
W xO
3.2 10 3
1.6 10
19
10 21 5 10 4 120 10 4
IL dA dy dx
0 0
ph 3.33 xO
_______________________________________
We n p p dx
0
Then
Semiconductor Physics and Devices: Basic Principles, 4th edition Chapter 14
By D. A. Neamen Problem Solutions
______________________________________________________________________________________
xO
(c) I L eGL A W Ln L p
I L We n p O p exp x dx
1.6 10 19
10 10
21 3
0
We n p O p 2.095 35.36 10.010 4
1 xO I L 7.593 10 4 A 0.7593 mA
exp x
0 _______________________________________
which becomes
I L We n p O p 1 exp xO
14.23
In the n-region under steady state and for
Now 0 , we have
I L 50 10 4 1.6 10 19 1200 45050 d 2 p n p
2 10
10 16 7
1 exp 5 10 10 4 4 Dp
dx 2
GL n 0
p
or or
I L 0.131 A d 2 p n p n G
_______________________________________ 2 L
dx 2
Lp Dp
14.22 where L p D p p and where x is
Vbi 0.0259 ln
10 2 10 16 15
positive in the negative x direction. The
1.5 1010
2
homogenerous solution is found from
0.6530 V d 2 p nh p nh
2 0
L n D n n 0 255 10 7 dx 2 Lp
The general solution is found to be
3.536 10 3 cm
x
B exp x
L p D p p 0 1010 7 p nh x A exp
Lp Lp
10 3 cm The particular solution is found from
2 V V R N a N d
1/ 2
p np G
W s bi 2 L
N N Lp Dp
e a d
211.7 8.85 10 14 0.653 5
which yields
1.6 10 19 p np
G L L2p
G L p
1/ 2
Dp
1016 2 1015
16 The total solution is the sum of the
10 2 10
15
homogeneous and particular solutions, so we
Then have
x
W 2.095 10 4 cm p n x A exp B exp x G L p
(a) I L1 eWG L A Lp Lp
1.6 10 19 2.095 10 4 10 21 10 3 One boundary condition is that p n remains
3.352 10 A 33.52 A 5 finite as x which means that B 0 .
(b) In n-region, Then at x 0 , p n 0 0 p n 0 p nO , so
p G L p 0 10 21 10 7 1014 cm 3 that p n 0 p nO .
We find that
In p-region,
n G L n0 10 21 5 10 7
A p nO GL p
The solution is then written as
51014 cm 3
x
p n x G L p G L p p nO exp
Lp
Semiconductor Physics and Devices: Basic Principles, 4th edition Chapter 14
By D. A. Neamen Problem Solutions
______________________________________________________________________________________
J p eD p
d p n x
(a) G L 0
I 0
10 3 0.080
dx x 0 h 1.6 10 19 1.5
But 3.33 10 20 cm 3 s 1
d p n d p n Then
dx dx G L x G L 0 exp x
since x and x are in opposite directions.
So
3.33 10 20 exp 10 3 x
eD p p nO
J p eG L L p J L 5.33 10 2 A/cm 2 53.3 mA/cm 2
Lp _______________________________________
_______________________________________
14.26
14.24 (a) J L eWG L
(a) J L e o 1 exp W
1.6 10 19 20 10 4 10 21
Diode A: J L 1.6 10 19
5 10 17
0.32 A/cm 2
14.28 14.33
For Al x Ga1 x As system, a direct bandgap for We can write the external quantum efficiency
0 x 0.45 , we have as
E g 1.424 1.247 x ext T1T2
where T1 1 R1 and where R1 is the
At x 0.45 , E g 1.985 eV, so for the direct
reflection coefficient (Fresnel loss), and the
bandgap
factor T 2 is the fraction of photons that do not
1.424 E g 1.985 eV
experience total internal reflection. We have
which yields 2
0.625 0.871 m n n1
R1 2
_______________________________________ n 2 n1
so that
14.29 2
n n1
(a) From Figure 14.24, E g 1.64 eV T1 1 R1 1 2
1.24 1.24 n 2 n1
0.756 m which reduces to
Eg 1.64
4n1 n 2
(b) From Figure 14.24, E g 1.78 eV T1
n1 n 2 2
1.24 1.24
0.697 m Now consider the solid angle from the source
Eg 1.78 point. The surface area described by the solid
_______________________________________ angle is p 2 . The factor T1 is given by
p2
14.30 T1
1.24 1.24 4 R 2
Eg 1.85 eV From the geometry, we have
0.670
From Figure 14.23, x 0.35 p 2
sin C p 2R sin C
_______________________________________ 2 R 2
Then the area is
14.31
1.24 1.24 A p 2 4 R 2 sin 2 C
Eg 1.85 eV 2
0.670
Now
From Figure 14.24, x 0.38
p2
_______________________________________ T1 sin 2 C
4 R 2 2
14.32 From a trig identity, we have
(a) For GaAs, n 2 3.66 and for air, n1 1.0 . 1
sin 2 C 1 cos C
The critical angle is 2 2
n 1 Then
C sin 1 1 sin 1 15.86
n2 3.66 T1 1 cos C
1
The fraction of photons that will not 2
experience total internal reflection is The external quantum efficiency is now
2 C 215.86 4n1 n 2
1 cos C
1
8.81% ext T1T2
360 360 n1 n2 2
2
(b)Fresnel loss: or
2
n n1
2 2n1 n 2
3.66 1 ext 1 cos C
R 2 0.3258
2
n n 1 3.66 1 n1 n 2 2
The fraction of photons emitted is then _______________________________________
0.08811 0.3258 0.0594 5.94%
_______________________________________
Semiconductor Physics and Devices: Basic Principles, 4th edition Chapter 14
By D. A. Neamen Problem Solutions
______________________________________________________________________________________
14.34 14.35
For an optical cavity, we have For GaAs:
h 1.42 eV
1.24
0.873 m
N L
2 1.42
If changes slightly, then N changes slightly Then
also. We can write
2
0.873 10
4 2
5.08 10 7 cm
N 1 1 N 1 1 2
2L 275 10
4
2 2 or
Rearranging terms, we find
5.08 10 3 m
N 1 1 N 1 1 2 N 1 1 N 1 2 2
0 _______________________________________
2 2 2 2 2
If we define 1 2 , then we have
N1
2
2 2
We can approximate 2 , then
N 1 2L
L N1
2
Then
1 2L
2 2
which yields
2
2L
_______________________________________
The ambipolar transport equation for minority carrier holes in steady state is expressed as \(0 = D_p \frac{d^2 \delta p}{dx^2} - \frac{\delta p}{\tau_p} + G\), where \(D_p\) is the diffusion coefficient, \(\delta p\) is the excess minority carrier hole concentration, \(\tau_p\) is the minority carrier lifetime, and \(G\) is the generation rate. This equation becomes linked to the photon flux \(\Phi(x) = \Phi_0 e^{-\alpha x}\) and the generation rate \(G(x) = \alpha \Phi_0 e^{-\alpha x}\), where \(\alpha\) is the absorption coefficient .
Matheson's rule is used to approximate the absorption of multi-layered semiconductor devices by relating absorption coefficients through a weighted sum based on material composition: \(\alpha(\lambda)_{eff} = \sum c_i \alpha_i(\lambda)\) where \(c_i\) is the fraction of material \(i\). This helps in designing devices like multi-junction solar cells, ensuring optimal layer thicknesses and compositions are chosen for broad-spectrum absorption and efficiency. Correct application improves light absorption efficiency while minimizing material costs .
The external quantum efficiency (EQE) of a solar cell indicates the effectiveness of converting incident photons into electrical current. It depends on photon absorption and minority carrier diffusion. When photons are absorbed, electron-hole pairs are generated. These carriers must reach the p-n junction; thus, good diffusion properties and low recombination improve EQE. Specifically, EQE is the product of the absorption efficiency, the collection efficiency of carriers, and the ratio of carriers reaching the junction .
The relationship is derived through the diode equation \(V = n V_T \ln \left(\frac{I}{I_S} + 1\right)\), where \(I\) is the current, \(I_S\) is the reverse saturation current, \(V_T\) is the thermal voltage, and \(n\) is the ideality factor. In large bandgap semiconductors, \(I_S\) is typically smaller, which leads to higher open-circuit voltages \(V_{OC}\). The reverse saturation current can be expressed as \(I_S = A e^{\frac{-E_g}{kT}}\), where \(A\) is a constant, \(E_g\) is the bandgap energy, \(k\) is Boltzmann's constant, and \(T\) is the temperature .
In p-type semiconductors, the space charge region significantly influences electron transport. The presence of an electric field due to the space charge affects electron motion, enhancing drift currents over diffusion, as indicated by \(0 = D_n \frac{d^2 \delta n}{dx^2} - \frac{\delta n}{\tau_n} + G\). The boundary conditions at the space charge edges modify the general solution for minority carrier concentrations, \(\delta n(x)\), typically reducing it in the depletion region due to recombination, as the recombination rate exceeds generation .
The saturation current \(I_S\) in p-n junctions is influenced by material properties, junction area, carrier lifetimes, and intrinsic carrier concentration. It is expressed as \(I_S = q A n_i^2 \left( \frac{1}{N_A \tau_p} + \frac{1}{N_D \tau_n} \right)\), where \(q\) is the charge, \(A\) is the junction area, \(n_i\) is the intrinsic carrier concentration, \(N_A\) and \(N_D\) are doping concentrations, and \(\tau_p\) and \(\tau_n\) are carrier lifetimes. A lower \(I_S\) improves device performance by reducing leakage currents and enhancing open-circuit voltage .
The parameter \(\alpha\), known as the absorption coefficient, determines how strongly a material absorbs light at a given wavelength. It is a measure of the exponential attenuation of the light as it penetrates the material: \(\Phi(x) = \Phi_0 e^{-\alpha x}\). A higher \(\alpha\) implies a short penetration depth, meaning photons are absorbed closer to the surface. For example, in semiconductors, the penetration depth \(d\) relates to \(\alpha\) by \(d = \frac{1}{\alpha}\).
The diffusion length \(L_D\) in a semiconductor photodetector is crucial because it determines the mean distance minority carriers (generated by absorbed photons) travel before recombination. Efficiency is maximized when \(L_D\) greatly exceeds the depletion width. It ensures generated carriers contribute to the photocurrent and are efficiently collected at the contacts. Photodetectors require a long \(L_D\) to enhance sensitivity, as based on \(L_D = \sqrt{D_n \tau_n}\), where \(D_n\) is the diffusion coefficient and \(\tau_n\) is the carrier lifetime .
The open-circuit voltage \(V_{OC}\) in photovoltaic devices is described by the equation \(V_{OC} = n V_T \ln \left(\frac{I_L}{I_S} + 1\right)\), where \(I_L\) is the light-generated current, \(I_S\) is the diode saturation current, \(V_T\) is the thermal voltage, and \(n\) is the diode ideality factor. \(V_{OC}\) increases with \(I_L\) and decreases with \(I_S\): as \(I_S\) relates to recombination losses, a lower \(I_S\) results in a higher \(V_{OC}\).
Generation refers to the creation of electron-hole pairs as a result of energy absorption, such as from photons, while recombination is their annihilation, returning them to the atomic lattice. The carrier lifetime \(\tau\) is affected by both processes: a higher generation rate due to light can increase the number of carriers, reducing effective lifetimes as it enhances non-radiative recombination. These processes are modeled by the rate equation \(\frac{d\delta p}{dt} = G - \frac{\delta p}{\tau}\). The net effect on \(\tau\) depends on material properties and illumination conditions .