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Floor
Planning
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Physical Design Course Schedule ‘IVLSIGURU
+ WEEK_1: VLSI Physical Design Traini
vi
straints
Timing,
jifferent units)
WEEK 3 : Floorplan, PowerPlan
‘Area calculation, Shapes(Rectangle, Rectilinear) of Floorplans,
1O/Macro placement, Special Cells(DOCAP/WELLTAP/ENDCAP)
usage, Placement/Routing Blockages, Regions/Guides, Congestion
Power Routing: Need for separate Power Routing, Types of Power
Routing, PG-Rings/Strap/Mesh and std cell rail
ASIC Design and PD Flow TIVLSIGURU
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Other PD Flow -Representations TIVLSIGURU
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Agenda : Floorplanning IVLSIGURU
O Related Terms
O Goals and Objectives of Floorplanning
Q Die Size Estimation
O Flat and Hierarchical Floorplan (Advantages/Disadvantages)
O Hierarchical Block : Pin Assignment
Channels: Floorplan with Channels /Abutted Floorplan
Macro Placement Guidelines
O Blockages(Hard/Soft), PG Rings, Straps
O Special cells
O Floorplan sign-off checks
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Floorplanning : Related Terms/Objects ‘IVLSIGURU
Q Width, Height, Shape, Aspect Ratio
Q Chip Boundary/Size
0 Core Boundary
0 Pads, Macros, Halos, KeepOut Margin
Q Location, Orientation of Macros.
QO Ring, Power Grid
1 Module Guide, Region, Fence
O Placement Blockage(Hard/Soft, Full/Partial), Routing Blockage
Q WellTap Cells, EndCap Cells
Q Density/Utilization
Visi
Demonstrating few Terms = FY
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‘Spacingaround Macros
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TIVLSIGURU
73 Sais ining Wrenn
Assign shape and location of Blocks/Macros =
1G Decide location of 1/0 pads. SSS!
1 ect toes cic ie >=
1G Daaatypa tteyerawteiiatoe,
Q. Decide locationand type of clock distribution. S
> Objectives panei cos
(leap lady connie Biacl a gaicaliyeloacto aatirediae
Minimize chip area(low cost)
1 Maries deg igh oT Sy)
© Minimize wirelength.
Atypical SoC could include hundreds of RAMS, soft and hard IP(Intellectual property),
analog blocks.
8
as 6) 375 25 |
je Size Estim: n - Factors
Total Die Area comprises -
Core Area
1, Standard cell area ~ Total area ofall modes inthe design and area of al
buffers added for timing fixes
2, Memonyitacros area
2. Analog/Other Macros area
+10 Area
4. Total no of Signal Pads
2-Totalno of Power Pads
Aspect Ratio
+ Aspect Ratio = Width/Height
+ Decide the aspect ratio based on the avaiable horizontal & vertical routing tracks,
Utilization (Thumb rule): Should be less than 70%
)
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Die Size Estimation
TIVLSIGURU
Design can become
(2) Core limited Design
The size of the chip is decided based on the size of the core region (logic). The number of
pads are less, so that the pads can be placed around the core.
(b) Pad Limited Design
Size of the chip is decided based on the No. of pads, because the core region is very small
‘The size of the die is decided based on the below factors
= Core Limited/Pad Limited Die
= Number of 0's
= =
=
im
[Link] limited _b, Pad Lifted
core Limited Design
tthe core areas more than
the 1/0 padsarea thea the
dle size willbe deterned
by core area
1 Incoreiinited design we
hhavolarge nof cls and
lesser no of1/0 pads
Wlimitations@
Pad Limited Design
rte 1/0 pa areas more
‘ham the core area then the
cle size willbe determined
by 1/0 padares|
Din padiimited design we
hayelarge noo /O pads
and lesser no ofloi cel
10
Chip Level Floorplans : Flat and Hierarchical VVLSIGURU
Flat Chip Floorplan Hierarchical Chip Floorplan
hitpssww. [Link]-saurabh!
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‘Flat Floorplan Design : BIvisieuRU
> It support optimization across functional
boundaries resulting in smaller, faster
chips
> This design easily maps with todays flat
place and route technologies
> It requires EDA tools to support high capacity.
> Does not help scope with the complexity
2
. ; __ BIVLSIGURU
Hierarchical Floor Planning (Design Planning)
> Ahierarchical design methodology is an efficient approach for managing large designs.
> By dividing the design into multiple blocks, different design teams can work on each block in parallel, from
RTL through physical implementation.
> Working with smallerblocks and using multiply-instantiated blocks can reduce overallruntime.
> Design planning is performed during the first stage of the hierarchical flow to partition the design into blocks,
‘generate hierarchical physical design constraints, and allocate top-level timing budgets to lower-level physical
blocks.
> Divided portions are termed as BLOCK, TILE, SUB-BLOCK, SUB-CHIP; Can be of Rectangular/Rectilinearshape.
Closing smaller BLOCKsis fast and easy and independent while Chip level instantiates Black Boxes.
> Once completed, can be integrated into chip. Fullchip Desian
Skt] [Bk2] [ens
Par] [Par] [Par
Fiow| [Flow | | Flow
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Fulichip Timing &
Verification
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Hierarchical Design Plan: Advantages / DisAdvantages
> Advantages
¥ Faster runtime, ess memory needed for EDA tools
¥ Faster ecoturn-around time
% Ability to do design re-use
> Disadvantages
Much more difficult for fullchip timing closure.
> More intensivedesign planning needed
Feedthrough generation, repeater insertion
Timing constraint budgeting
Hierarchical Chip Floorplan : A Sample ‘IVLSIGURU
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Hierarchical Chip Floorplan
Block-3
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Floorplanning : Pin(or IO) Assignment
> Pin constraints include parameters such as,
¥ Layer,spacing
Size([Link])
Overlap(in different layers) allowed or not
Pin guides
ane
Types of Floorplan
> Channeled Floorplan
¥ Channeled floorplans contain spacing between
blocks for the placement of top-level macro
cells.
¥ The spacing enables the tool to place standard
cells between blocks.
» Abutted Floorplan
¥ Inthe abutted floorplan style, blocksare
touching and the tool does not allocatespace for
macro cell placement between blocks.
¥- Designs with abutted floorplans do not require
top-level optimization, as alllogicis pushed
down into the blocks
@
2
[Link]-saurabh
TIVLSIGURU
Pin guide +
Pin guide 2
Parton
16
TIVLSIGURU
Blocks
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TWIVLSIGURU
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Macro placement Guidelines
» Macro should be placed near to the Boundary/Edges.
+ Macro should be placed according to their hierarchy
» Macro channel space(calculation) should be proper
» Macro pins should be accessible
» Macro pins orientation should correct or towards the core
» Maximum space for the standard cell and routing,
» Fly line Analysis, port Connectivity to be considered.
» Orientation, Alignment of Macros has significance.
18
‘Macro Grouping “TIVLSIGURU
> Ramsare grouped based on module
ames / data flow / timing / congestion.
> Adjacent ram pins should align, iframs
Delong to same logic/heightto get better
routing
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Macro Grouping TIVLSIGURU
Bad Floorplan Good Floorplan
Channel Width Calculation TBIVLSIGURU
> To calculate the channel length b/w macros
No of Pins
Spacing b/w macros = ~
Available layers
> Channel should accommodateat least 1 to 2 powersstraps + Block Halos + End caps cells + Switch cells (if
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TIVLSIGURU
Floor plan : Other Objects
> Blockages can also be
added in the floorplan to
rohibit standards cells
from being placed in
those areas
2
Special Cells IVLSIGURU
> Well Taps
Y Well tap cellsare used to connect the VDD or GND to substrate or n-well respectively.
This tohelp prevention of latch-up,
Ore leet eet etree emt as eer
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Special cells TIVLSIGURU
> Endeaps cells
¥ During fabrication, Poly variation is more at the edges. To account for that poly variation, dummy cells are
inserted at the edges of the row so that manufacturing defects are reduced.
LI ‘ |
a = Sia Rows
Endcops i. 2 endcaps
“il Ei Hi
IT 1
4
Special cells TIVLSIGURU
Y These cells are used in Low-power applications.
¥ These cells are used to switch off the power domain when blocks are not in active state thus
reducing leakage current, Normal
SWITCHES,
Staggered
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Floorplan signoff checks SMS
> Visual checks
Macros should be grouped based on data flow diagram
‘Should check macro are placed based on floorplan guidelines and have fixed attribute.
‘Should check end caps are placed and have fixed attribute.
‘Should check welltaps are added at regular intervals and have fixed attribute
‘Should check macro power tapping has done properly or not.
‘Should check Standard cell power rails to top layermetal vias are dropped properly or not.
SAS Sean
> Reports checks
> Utilizationshould be under controlsafter floorplanning is done.
¥ IR drop should be within the limit.
26
What isa FlipiChip 2 BvescuRU
Based on Packaging, Bond Pads placement, Chips Floor Plan can be classified
as:
1. Wire Bond Chip
2. Flip Chip
27
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IC Compiler GUI
Floorplanning Toolbars(ICC) IVLSIGURU
—
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TIVLSIGURU
Creating Floorplan (ICC Tool Command)
create floorplan
[bottom io2core distance]
[control type aspect ratio | width and height | boundary]
[core aspect ratio ratio]
[core utilization ratio]
[flip first_row]
[-keep_io place]
|-macro_place]
[-keop std cell place]
[left io2core distance]
[-min_pad height]
[-ne double back]
[pad limit]
[right io2cor
[start first_row]
[top io2core distance]
[use vertical row]
cance]
TIVLSIGURU
Power
Planning
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Agenda : Power Planning TIVLSIGURU
O Related Terms
O Objectives of Power Planning
O Power Estimation
0 Types of Power (Static, Dynamic, Leakage)
O Power Planning
Power Mesh
Ci Issues : (IR Drop,Ground Bounce, EM)
EM and IR-Drop Violations : Reasons and Solutions
O Power Planning : Sanity Checks
0 Power Analysis(sign-off checks)
32
Power Planning : Related Terms/Objects @1VLSIGURU
O Power Distribution, Power Network, Power Grid
CEM : Electro Migration
CEMIR(or EMR), IR-Drop, Power EM
10 Ring, PG Ring
O Power & Ground (PG)
CIR-Drop (Static, Dynamic, Vector-less)
OQ Ground Bounce
C Low Power Chip/Design, Multiple Power Domains
C Level Shifters, Power Switches,
O AlwaysON Block ; ON/OFF Block
Qa Is for P
¥ Apache ; RedHawk
¥ — Cadence:Voltus (Earlier: EPS-Encounter Power System, Voltage Storm)
¥ Synopsys : PrimeRail+PTPX
33
») sete
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Objectives of Power Planning/Routing
> To distribute the power from power pads to all elements of the chip.
> Unified supply of power with less voltage drop.
> Aproper Power design should aim at using as less routing resources as
possible.
> Power Analysis checks (IR/EM) should be done after power planning is
Completed
au
. . TIVLSIGURU
Power Estimation
Power Estimation is based on Total Power consumed by the Chip :
> 10 Power
> Core Power ([Link]) + Memory/Macro Power
Core Power = Combinational logic Power + Sequential + Clock Power
Where does the all power go
to?
35
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Types of Power
+ Internal power (Static)
Power dissipated due to cell internal loads and short circuit current,
current flowing from VDD to VSS when both PMOS and NMOS are
completely/partially ON
+ Switching power(Dynamic)
Power dissipated due to standard cell, pads and macros charging and
discharging the output load (interconnect + fanout loads)
+ Leakage power
Due to leakage current in MOS Designs can have as high as 40%
leakage contributions
Power Planning
> Power Planning includes :
¥ proper Estimation of power of chip
¥ power routing the design based on the estimation.
> We create a mesh kind of structure, so that instance(s)
can take direct supply from the nearest point
> We create multiple VDD and VSS lines(for each
power domain)
> Hierarchical Mesh from upper metal layers to
lowest(Mlor M2 layers for standard cells). Connection
from higher to adjacent lower metal layer is through
VIAs
®
>
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36
TIVisIGURU
Power Ring, Power Straps, Power Mesh
37
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Why create mesh kind of structure ?
> To distribute the Power from power pads/pins to all elements of the chip.
> Provides multiple paths from PG sources to destinations (less series resistance)
> Uniformly distribute power with less voltage drop.
> To meet IR/EM targets
> For meeting timing requirements
> Simultaneous Switching : Sometime it happens that, many instances switch from 0 to
Lor vice-versa) almost at the same time, needing a huge amount of current; In this
scenario this mesh kind of structure is very helpful !
‘Simultaneous Switching: Sometime it happens that,
‘many instances switch from 0 to (or vice-versa)
almostat the same time, needinga huge amount of
current; In this scenario this mesh kind of structure Is
very helpful !
Power Mesh : Sample Pictures
VertialPower Stand
Stipes Power Rall,
Conuect Core Power Pads to
Core Poser Rings
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2
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Power Planning Issues
» IR Drop
» Ground bounce
> EM violations
40
"Wivisieuru!
Reduction in voltage that occurs on power supply networks (VDD)
IC design expects availabilty of ideal power supply
In reality, localized voltage drops within the power grid
> Increasing current/area on die
> Narrower metal line widths (increases power grid resistance)
Results in decreased power supply voltage at cells/transistors,
> Decreases the operating voltage of the chip, resultingiin timing and functional failures
vvy
a
IR Drop on Power Rail
2, ,Current through =
“Sop (Shave ams
=
4
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eneanele la ee
TIVLSIGURU
jroun. 1c
> Increase in voltage that occurs on ground networks (VSS or GND) in integrated circuits
> Increase in ground voltage decreases the operating voltage of the chip, resulting in timing and,
functional problems
Lr ra TL
be
[ew] ne
“a ‘Current
2
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EM violations @visicuru! |
> electromigration (EM) refers to the unwanted movement of materials ina [em a
conductor. If the current density is high enough, there can be a momentum
transfer from moving electrons to the metal ions that make up the lattice of the
interconnect material. The ions will drift in the direction of the electron flow. The
results the gradual displacement of metal atoms in a conductor.
> The effect is important in applications where high direct current densities are
used, such as in microelectronics and related structures. As the structure size in
electronics such as integrated circuits (ICs) decreases, the practical significance
of this effect increases
> Results of EM in ICs: The VOIDs and HILLOCKs gets created and potentially
causing open and short circuits.
(0) Mek A oe 43
2
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Reasons of IR Drop Violations
» Power structure is not proper.
> Cell density is very high.
- Instances are not get proper power because of no straps
over there
» Mesh structure is proper but there is no via.
44
I vesicuRU
How to reduce IR drop ?
» Routing should be from Top Layer.
» By adding some more Power Stripes.
- By increasing the width of the metal.
v By adding Decaps(DCAP cells).
v By using some Low Power Techniques
45
») scuation #
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EM violations : Reasons and Solution in PD
> Reasons of EM violation:
1. High Fanout Net (multiple fanout cells switch simultaneously, draws larger
current from driver)
2. Higher Driver Strength Cells(delivers large current unnecessarily, heating up the wire)
3, Higher frequency (quick transitions)
4, Narrow metal width
5, Metal slotting (resulting into narrower widths)
6. Long Nets (because of larger resistance, higher localized temperature)
» Solutions of EM violations
[Link] Driver's drive Strength
2. NonDefault (wider) rule based routing.
3. Insert buffer on long nets.
4, Route with higher metal layers(less resistive, higher tolerance (current carrying capabilities)
5. Use multi-Cut Via
6. Break the fanout (have lesser fanouts)
7. Use wider metals (more width)
lS aveisicuRU
Power Plan Checks
« There should be no open connection
+ All the Macros should be hooked up with Power/Ground.
. IR/EM target should be met.
. Missing Vias should be taken care
+ There should be no Hot Spots (during IR-Drop Analysis)
47
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Whatis a Flip-Chip ? TIVLSIGURU
Based on packaging, Chips can be classified as :
1. Wire Bond Chip
2. Flip Chip
IR drop Map
Hot Spot Voltage Drop Map Of Bumped Design
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