A Python-based tool for modeling optical photolithography
Maskless photolithography system targeting 5um resolution. Open hardware design.
Desktop app for lithography learning available for Windows, macOS, and Linux
Lithography simulator
repo for the website of neural litho project
PolyHatch is an AutoCAD script written in lisp language to automate a basic photolithography photomask verification. The purpose of this scrip is to look for closed polylines within a given selection of drawings in a list of layers and hatch them.
High performance jax-based photolithography simulation.
A CAM toolchain for making PCBs at home — one tool for the whole cycle, from Gerber/Excellon fab package to a finished board. UV photolithography today; CNC drilling, edge-cut routing & fiducials on the roadmap.
Basic parameteric shapes to facilitate mask design in CleWin
Optical Proximity Correction (OPC) is a photolithography technique that modifies photomask geometry to counteract diffraction and process effects, ensuring accurate printing of patterns on the wafer. This work demonstrates a proof of concept showing how using a GPU-based approach can significantly speed up these modifications compared to a CPU.
Photolithographic mask visualization and automatic microelectrode array design
JMP-based lithography line-width CD control, SPC, ANOVA, and process capability analysis using NIST wafer data.
基于LED阵列的365nm紫外光自动匀光系统 | 365nm UV LED Auto-Uniformity System for Photolithography
Precision control software for photolithography systems. Optimized for R-LithoPhos workflows.
Optimized photolithography process using JMP & Six Sigma to eliminate 9.3% scrap. Resolved low Dose & PEB_Temp issues by shifting parameters (Dose=35, PEB_Temp=130°C). Boosted process capability (Cpk) by +372% (0.44 to 2.075) and achieved 0.6608µm Critical Dimension (target 0.65).
A plugin for KLayout that generates a machine-readable barcode for GCA optical steppers.
MOSFET front-end fabrication lab covering oxidation, photolithography, oxide etching, phosphorus diffusion, drive-in, gate oxide formation, and process measurement.
JMP-based lithography focus-dose process window and yield analysis using public exposure and inspection data.
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